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> 150 mm silicon wafers with silicon dioxide/nitride
150 mm silicon wafers with silicon dioxide/nitride
These wafers were brand new and carefully packaged to avoid any contamation. They are double sealed in cleanroom boxes.
The wafers are 150 mm (6-inch) silicon (100) wafers. They have a thin layer of thermally grown silicon dioxide (high temperature oxide). The next layer is 1-3 um low temperature grown silicon oxide (such as PECVD), and the top layer is PECVD deposited Silicon nitride with a thickness of 0.3 um.
These wafers are great for MEMS researcher and materials science researchers.
