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Veeco oasis 3000 deep uv defect inspection system


VEECO OASIS 3000 DEEP ULTRA VIOLET DEFECT INSPECTION SYSTEM
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The OASIS 3000 DUV (Deep Ultra Violet) system fulfills two functions in thin film magnetic head process development and production: automatic identification and characterization of defects, and automatic measurement of pole tip critical dimensions to 100nm. The OASIS 3000 system is a critical tool in current 40GB programs, and will also be required for future 60GB applications. The OASIS 3000 automatically identifies and characterizes a broad range of defects such as coating, chips, voids and etch defects. The OASIS 3000 provides 248nm DUV illumination and imaging to measure writer widths to 100nm, and quantify other critical dimension measurements such as writer height, shield thickness with nanometer accuracy.



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